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Semi Automated Wet Bench
Applications
- Cleaning (SC 1, SC2)
- Stripping (Piranha, SPM)
- Etching (Nitride etch, SiO2 Etch; Si -Etch)
- Dry in - Wet out
Throughput
- Up to 150 Wafers per hour (applies to Multibatch only, dependant on configuration)
Substrate Sizes, Batch Sizes
- 2 x 25 Wafers 6”
- 1 x 25 Wafers 6” Multibatch
- 1 x 25 Wafers 8”
- 1 x 25 Wafers 8” Multibatch
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