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Wet Process Applications

Gemenex Mini-Gemenex Advanced IPA-Dryer Manual Wet Bench Fume Hood

Parts Cleaning Chemical Management

Advanced IPA Dryer

Applications

Drying of hydrohilic and hydrophobic wafers

Throughput

Up to 300 Wafers /h

Substrate Sizes, Batch Sizes

2 x 25 Wafers 6”
2 x 25 Wafers 8”
1 x 50 Wafers 8”
1 x 50 Wafers 12”
Hard Disks 2,5” and 3,5“
1 x 25 Wafers 6”, 1 x 25 Wafers 8”

Highlights

Surface tension gradient drying: stress free drying without watermarks for higher yield (not applicable for membranes)
Very low consumption of IPA
High level safety design
Outstanding particle performance
Low Cost of Ownership (CoO)
long life components
minimal maintenance requirements
Touch Screen Operation
Communication Interface to Wet Bench by Dry Contacts

Options

FM 4910 compatibility
Ultra compact version (550mm width)
Conversion kits (e.g. 8" - 12")